T he NFF (CWB) has been awarded funding from the Office of the Vice-President for Research and Development (VPRDO) to acquire a new electron beam lithography system EBPG5150+, from Raith B.V.. This system will replace the old JEOL JBX-6300FS, which has been experiencing performance degradation and long downtime due to obsolete parts.
The new EBPG5150+ offers reliable and repeatable results with exceptional precision, ensuring optimal fabrication design across all performance dimensions. Key features of this high-resolution system include a resolution of ≤ 8 nm, overlay accuracy of ≤ 5 nm, and stitching accuracy of ≤ 8 nm. Additionally, the optional Firebird pattern generator provides multi-core shape calculation processing technology, which reduces fabrication time at high writing frequencies for complex basic shapes. The expected delivery date will be at the end of 2026.