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The installation of ICP etcher for compound semiconductor and plasma enhanced chemical vapor deposition (PECVD) system were completed in 2022.
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Wet-stations upgrade: NFF(CWB) is working on the replacement of all wet-stations over the next several years due to equipment aging. The replacement of wet-station A and wet-station B were completed in 2022. These wet-stations are heavily used by our users for wafer cleaning.
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A new chemical and mechanical polisher (CMP) was installed in NFF(CWB)-NDL in 2022. It can provide additional process capability on wafer polishing on different substrates with different sizes. The replacement of polishing pad was very cost-efficient and very suited for research laboratories.