The Greater China Nano Fabrication Consortium (GCNFC)
The Greater China Nano Fabrication Consortium (GCNFC) is administered under the NFF as a new open platform for academia and industry in Hong Kong and China to share-use state-of-the-art nanofabrication facilities and exchange cleanroom management experiences / expertise...
New Equipment & Process Capabilities
In August 2018, the NFF has launched the Deep Reactive Ion Etching (DRIE) Process Center in Rm. 2223. There are two DRIE etchers for different cleanliness levels. One of them is for non-standard DRIE etching processes, which the NFF did not support previously. With the extended DRIE capability, the NFF can now support the whole range of cleanliness levels for DRIE processes. Moreover, a P-10 Step Profiler and a Nikon optical microscope are in service at the Center for in-line measurements and sample inspections...
The CAS-HKUST Microelectronics Joint Laboratory Review
The Institute of Microelectronics of Chinese Academy of Sciences (IMECAS) and the HKUST have long established the CAS-HKUST Microelectronics Joint Laboratory since 1997...
Software Supports
Since May 2018, the NFF has started to provide two licensed software, LinkCAD and DeScribe, for supporting NFF users’ researches and projects...
The NFF T-Shirts
The NFF has designed a new T-shirt with an NFF logo for members of the NFF community...
Publication Highlights
NFF user, Si ZHU’s paper titled “Room-temperature electrically-pumped 1.5 μm InGaAs/InAlGaAs laser...
Seminars
On 26 June 2018, Mr. Wilbur CATABAY, Senior Vice President, TDCS & Corporate Strategy of TSI...
Workshops
“NFF Workshop on the 3-D Laser Lithography/Nano Printer” was held on 31 May 2018, given by...
