DRIE and the DRIE Process Center
A new Deep Reactive Ion Etcher (DRIE), SPTS Rapier, has been installed and in service in the recently launched NFF-DRIE Process Center (Rm. 2223). This equipment was funded by the Research Grants Council Collaborative Research Fund (RGC-CRF) equipment grant 2016/17.
The NFF acknowledges the generous supports and contributions from the HKUST’s Senior Management and Co-PIs as listed below:
Prof. Yang CHAI (PolyU), Prof. Ho Bun CHAN (HKUST),
Prof. Mansun CHAN (HKUST), Prof. Gary Shun Pan CHEUNG (HKU),
Prof. Hoi Wai CHOI (HKU), Prof. Zhiyong FAN (HKUST),
Prof. Kei May LAU (HKUST), Prof. Ricky Shi-Wei LEE (HKUST),
Prof. Yi-Kuen LEE (HKUST), Prof. Zhigang LI (HKUST),
Prof. Emma MACPHERSON (CUHK), Prof. Stella W. PANG (CityU),
Prof. Johnny K.O. SIN (HKUST), Prof. Weijia WEN (HKUST),
Prof. Man WONG (HKUST), Prof. Wenjing YE (HKUST),
Prof. Levent YOBAS (HKUST), Prof. Xuming ZHANG (PolyU).
In order to enhance the NFF’s Deep silicon etch capabilities, the NFF has launched a new DRIE Process Center in August 2018. In the Center, there are two DRIE etchers catering for different cleanliness levels. One of them is for non-standard DRIE etching processes, which the NFF did not support previously. With this extended DRIE process capability, the NFF can now support the whole range of cleanliness levels for DRIE processes. Moreover, a P-10 Step Profiler and a Nikon optical microscope are in service at the Center for in-line measurements and sample inspections.