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The NFF has been awarded the RGC Joint Laboratory Funding Scheme (JLFS) in June 2019 to acquire a state-of-the-art R&D-grade inductively coupled plasma (ICP) etching system for compound semiconductors. The application has been jointly submitted under the Joint Laboratory of Microelectronics of the NFF (HKUST) and the Institute of Microelectronics of the Chinese Academy of Sciences (IMECAS), in collaboration with major PIs including Profs. Kei May LAU and Kevin CHEN and an external PI Prof. Anthony CHOI (HKU).
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